DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

A display device and a method of manufacturing the display device are disclosed. In one aspect, the method includes forming a sacrificial layer over a carrier substrate, forming a passivation barrier layer to cover upper and lateral sides of the sacrificial layer and forming a thin film transistor layer over the passivation barrier layer. The method also includes placing a mask over the thin film transistor layer so as to expose an edge portion of the passivation barrier layer, wherein the edge portion does not overlap the mask in the depth dimension of the display device. The method further includes removing the edge portion of the passivation barrier layer so as to form a barrier layer and separating the carrier substrate from the barrier layer via the sacrificial layer.

主权项

1. A method of manufacturing a display device, comprising:
forming a sacrificial layer over a carrier substrate; forming a passivation barrier layer to cover upper and lateral sides of the sacrificial layer; forming a thin film transistor layer over the passivation barrier layer; placing a mask over the thin film transistor layer so as to expose an edge portion of the passivation barrier layer, wherein the edge portion does not overlap the mask in the depth dimension of the display device; removing the edge portion of the passivation barrier layer so as to form a barrier layer; and separating the carrier substrate from the barrier layer via the sacrificial layer.