发明名称 Nanoimprinting mold, method for producing the nanoimprinting mold, nanoimprinting method using the nanoimprinting mold, and method for producing patterned substrates
摘要 A nanoimprinting mold includes: a mold main body having a fine pattern of protrusions and recesses on a surface thereof; and a mold release layer formed on the surface of the mold main body. The mold release layer is formed within a mold release layer forming region, which is a region of the mold main body that includes a patterned region where the fine pattern of protrusions and recesses is formed and has an outer edge positioned outside the outer edge of the patterned region. An outer peripheral mold release layer has a thickness distribution in which the thickness of the outer peripheral mold release layer is locally maximal at positions outside the outer edge of the patterned region, substantially continuously along the entire periphery. Thereby, it becomes possible to restrict the region in which resist flows during nanoimprinting, without employing a mesa type substrate.
申请公布号 US9505165(B2) 申请公布日期 2016.11.29
申请号 US201414228501 申请日期 2014.03.28
申请人 FUJIFILM Corporation 发明人 Nakamura Kazuharu;Wakamatsu Satoshi
分类号 B29C59/02;B29C59/00;B29C33/58;B29C39/02;B29C43/02;G03F7/00;B82Y10/00;B82Y40/00;G03F7/16 主分类号 B29C59/02
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A nanoimprinting mold, comprising: a mold main body having a fine pattern of protrusions and recesses on a surface thereof; and a mold release layer formed on the surface of the mold main body; characterized by: the mold release layer being formed within a mold release layer forming region, which is a region of the mold main body that includes a patterned region where the fine pattern of protrusions and recesses is formed and has an outer edge positioned outside the outer edge of the patterned region; and an outer peripheral mold release layer, which is a part of the mold release layer between an outer edge of the patterned region and the outer edge of the mold release layer forming region, having a thickness distribution in which the thickness of the outer peripheral mold release layer is locally maximal at positions outside the outer edge of the patterned region, substantially continuously along the entire periphery, wherein the outer peripheral mold release layer has portions with the thickness becoming gradually thicker at positions closer to the outer edge thereof.
地址 Tokyo JP