发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In some embodiments the shape of the final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.</p>
申请公布号 KR100768945(B1) 申请公布日期 2007.10.19
申请号 KR20060039683 申请日期 2006.05.02
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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