| 摘要 |
PROBLEM TO BE SOLVED: To form patterns having high resolving power and depth of focus. SOLUTION: A mixture composed of >=2 kinds of base polymers having acid unstable groups varying from each other or a base polymer having >=2 kinds of the acid unstable groups varying from each other in the one molecule is used as the base polymer at the time of forming positive type patterns by applying a chemical amplification positive type resist material on a substrate to a uniform thickness to form a resist film, exposing this resist film and subjecting the film to post exposure baking, then developing the resist film with a developer. Further, the exposure E1 at which the average of the dissolution rate from the surface of the resist film to 500Åin a substrate direction attains 100Å/sec and the exposure E2 at which the average of the dissolution rate from the surface of the substrate to 1000Åin the resist film surface direction attains 100Å/sec are so adjusted as to attain -0.2<(E2-E1)/E2<0.2 by adjusting the kinds of the acid unstable groups varying from each other and the content thereof in the base polymer. |
