发明名称 |
FUNCTIONALLY GRADIENT MATERIALS AND THE MANUFACTURE THEREOF |
摘要 |
This invention relates to the synthesis of A1/SiC based functionally gradient materials using a new technique termed here as gradient slurry disintegration and deposition. Gradients of SiC were successfully established using this technique for the starting weight percentages up to 20 %. The results were confirmed using microstructural characterization techniques and microhardness measurements. Functionally gradient materials synthesized using this method holds the promise where differential tribological characteristics and the strength/toughness combinations may be required from the opposite surfaces. |
申请公布号 |
WO9967075(A2) |
申请公布日期 |
1999.12.29 |
申请号 |
WO1999SG00055 |
申请日期 |
1999.06.04 |
申请人 |
NATIONAL UNIVERSITY OF SINGAPORE;GUPTA, MANOJ |
发明人 |
GUPTA, MANOJ |
分类号 |
C22C1/10 |
主分类号 |
C22C1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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