发明名称 FUNCTIONALLY GRADIENT MATERIALS AND THE MANUFACTURE THEREOF
摘要 This invention relates to the synthesis of A1/SiC based functionally gradient materials using a new technique termed here as gradient slurry disintegration and deposition. Gradients of SiC were successfully established using this technique for the starting weight percentages up to 20 %. The results were confirmed using microstructural characterization techniques and microhardness measurements. Functionally gradient materials synthesized using this method holds the promise where differential tribological characteristics and the strength/toughness combinations may be required from the opposite surfaces.
申请公布号 WO9967075(A2) 申请公布日期 1999.12.29
申请号 WO1999SG00055 申请日期 1999.06.04
申请人 NATIONAL UNIVERSITY OF SINGAPORE;GUPTA, MANOJ 发明人 GUPTA, MANOJ
分类号 C22C1/10 主分类号 C22C1/10
代理机构 代理人
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