发明名称 PLATING SOLUTION FOR SURFACE TREATMENT AND METHOD FOR SURFACE TREATMENT
摘要 A plating solution is provided to produce plated products which are environmentally friendly and semi-permanent and restraint the generation of particles from the products by plating products with a plating solution having high functions including corrosion resistance, wear resistance and high hardness. A plating solution for surface treatment comprises: tungsten, cobalt and phosphorous as principal components; citric acid, Roussel salt, ammonium chloride and sodium tricitrate as supporting components; and ammonia water and an amine compound as a pH adjusting agent. The tungsten is contained in the plating solution in a content of 38 to 44% by weight. The tungsten is used in the form of sodium tungstate, ammonium tungstate or carbonyl tungsten in an amount of 25 to 250 g/L. The cobalt is used in the form of cobalt chloride, cobalt sulfate, cobalt carbonate, or cobalt tungstate in an amount of 25 to 250 g/L. The phosphorous is used in the form of mono sodium phosphate or mono potassium phosphate in an amount of 5 to 150 g/L.
申请公布号 KR20070117243(A) 申请公布日期 2007.12.12
申请号 KR20060051227 申请日期 2006.06.08
申请人 HAVIT INFORMATION. CO. 发明人 PARK, BYUNG SUN;SUNG, YUL SUP;LEE, SUNG
分类号 C23C22/42;C23C22/40 主分类号 C23C22/42
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