摘要 |
Method for producing microchips by using immersion lithography, wherein the immersion fluid comprises particles with a size of about 9 nm or less, and about 1 nm or more of a metal oxide, nitril or fluoride, wherein the particles have a functionalized surface. The exposure light in the method has improved resolution, so that microchips having an increased integration density are obtained. |
申请人 |
DSM IP ASSETS B.V.;JAHROMI, SHAHAB;BREMER, LEONARDUS, GERARDUS, BERNARDUS |
发明人 |
JAHROMI, SHAHAB;BREMER, LEONARDUS, GERARDUS, BERNARDUS |