发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD UTILIZING MEMS MIRROR WITH LARGE DEFLECTION BY NON-LINEAR SPRING
摘要 <P>PROBLEM TO BE SOLVED: To provide an array of individually controllable elements for modulating radiated beam. <P>SOLUTION: An array of individually controllable elements 30 for a lithographic apparatus comprises reflectors 31 that can be actuated by an actuator and are biased, to return to a given position by a force that varies non-linearly, with respect to the displacement of the reflector 31 from that position. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007293331(A) 申请公布日期 2007.11.08
申请号 JP20070099106 申请日期 2007.04.05
申请人 ASML NETHERLANDS BV 发明人 VENEMA WILLEM JURRIANUS
分类号 G02B26/10;G02B26/08;G03F7/20;H01L21/027 主分类号 G02B26/10
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