IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an imprint device advantageous for reducing a relative inclination between a mold and a substrate in a state in which the mold is in contact with an imprint material.SOLUTION: An imprint device comprises: an inclined part which relatively inclines a mold M and a substrate W; a detection part 11 which detects an interference pattern between the light reflected by the mold M and the light reflected by the substrate W; and a control part 12 which controls the inclined part so that the relative inclination between the mold M and the substrate M in a state in which the mold M is in contact with an imprint material on the substrate W is reduced on the basis of the interference pattern detected by the detection part 11 in the state in which the mold M is in contact with the imprint material.SELECTED DRAWING: Figure 1