| 摘要 |
PROBLEM TO BE SOLVED: To implement stable etching processing by identifying a combination suitable for change control of an etching processing condition from among light emission wavelengths of spectral measurement data, time intervals and changeable items of the etching processing condition.SOLUTION: For each of two or more combinations of the light emission wavelengths of spectral measurement data, time intervals and items of etching processing condition, a regression equation is calculated that indicates a correlation among the light emission wavelength of the spectral measurement data, a light emission intensity in the time interval and an etching result. Further, for each of the combinations, a variation of the regression equation in the case where a setting value of the corresponding item of the etching processing condition is changed, is calculated. Among the combinations, a combination with the smallest variation is identified as a combination of the light emission wavelength, the time interval and a changed item of the etching processing condition to be used for control.SELECTED DRAWING: Figure 1 |
