发明名称 POLYVINYL ALCOHOL TYPE PHOTOSENSITIVE RESIN AND PHOTOSENSITIVE RESIN COMPOSITION USING SAME
摘要 <p>PURPOSE: To obtain a water-soluble PVA type photosensitive resin having high sensitivity and satisfactory aging stability and easy to produce and to obtain a photosensitive resin compsn. using the photosensitive resin. CONSTITUTION: This photosensitive resin is a PVA deriv. having constituent units represented by general formulae I, II. In the formula I, X is a cation and (Q) is 0, 1 or 2. In the formula II, R1 is a residue of a quaternary arom. N-contg. hetero ring, R2 is H or lower alkoxyl, (m) is 0 or 1 and (n) is an integer of 1-6.</p>
申请公布号 JPH08320553(A) 申请公布日期 1996.12.03
申请号 JP19950128018 申请日期 1995.05.26
申请人 TOYO GOSEI KOGYO KK 发明人 SHIBUYA TORU;MIYAZAKI MITSUHARU;KIKUCHI HIDEO
分类号 G03F7/004;C08L29/04;G02B5/20;G03F3/10;G03F7/012;G03F7/038;G03F7/12;(IPC1-7):G03F7/012 主分类号 G03F7/004
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