Method of and apparatus for cleaning workpiece

摘要

A method of and an apparatus for cleaning workpiece is suitable for cleaning a substrate such as a semiconductor substrate, a glass substrate, or a liquid crystal panel to a high level of cleanliness. The method of cleaning a workpiece comprises the steps of holding a workpiece (1), scrubbing the workpiece with a cleaning member (3), and rubbing the cleaning member (3) against a member (15) having a rough surface to carry out a self-cleaning of the cleaning member (3). The cleaning member (3) which is contaminated by having scrubbed the workpiece (1) is rubbed against the rough surface (15b), and the rough surface (15b) scrapes the contaminant off the cleaning member (3). Therefore, the contaminant can effectively be removed from the cleaning member (3), and hence the cleaning member (3) has a high self-cleaning effect. <IMAGE>