| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce defects of a transferred pattern when exposing a substrate coated with a photosensitive material or the like to light by an immersion liquid method. <P>SOLUTION: In a resist coater 41 for applying a resist dissolved with a solvent to a substrate P, the solvent of the resist is diffused into an atmosphere in a chamber 42 where the substrate P is stored via a solvent vessel 61, a valve 62, and an air duct 44. The atmospheric pressure of the atmosphere is increased by a compressor or the like, or the temperature of the atmosphere is lowered, thus coating the substrate P with the resist in the atmosphere for suppressing the volatilization of the solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT |
