| 摘要 |
A substrate cleaning apparatus is provided to use a rectangle-shaped jet unit having a plurality of nozzle ports for compositely jetting a cleaning gas and a cleaning liquid therethrough to remove respective sorts of external particles and chemical solutions adhering to a substrate. A cleaning tank provides a working space. A gas supply unit(6) for supplying a cleaning gas is positioned within the cleaning tank. A liquid supply unit for supplying a cleaning liquid is joined to the gas supply unit, wherein the liquid supply unit faces the gas supply unit. A first jet unit(J1) has first nozzle ports(N1) which forms a rectangle-shaped fluid jet section between the gas supply unit and the liquid supply unit. The first jet unit has first nozzle ports(N1) distanced from each other at a uniform interval along the fluid jet section, wherein the first nozzle ports have fluid channels for compositely jetting the cleaning gas and the cleaning fluid therethrough. A second jet unit(J2) has second nozzle ports(N2) formed between the first nozzle ports, wherein the second nozzle ports have fluid channels for compositely jetting the cleaning gas and the cleaning fluid. |
