| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition, especially the photosensitive composition suitable for a double-layered or a multilayered resist, to provide a resin suitable for the photosensitive composition, and a compound suitable for the production of the resin, and to provide a pattern-forming method using the composition. <P>SOLUTION: The photosensitive composition contains (A) a resin containing a specific siloxane unit having a group leaving by the decomposition by the action of an acid, and enabling a dissolving rate in an alkali developing liquid to be increased by the action of the acid, and (B) a compound generating the acid by the irradiation with an active ray or a radial ray. The resin, the compound suitable for the production of the resin, and the pattern-forming method using the composition are also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
