MOVING OBJECT APPARATUS, ALIGNER, MEASUREMENT METHOD, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To measure a position of a reticle stage at high accuracy.

SOLUTION: Out of an interferometer for measuring the position of the reticle stage RST, at least optical systems 23Y1, 23Y2 for branching a reference beam and a measurement beam are fixed on a reticle stage fixing board RBS whose vibration is suppressed by a vibration proofing unit 14. Thereby, the reference beam and the measurement beam are not influenced by vibration, so that the position measurement of the reticle stage RST can be highly accurately performed, and further the reticle stage can be highly accurately moved.

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