发明名称 CLEANING METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, CLEANING MEMBER, MAINTENANCE METHOD AND EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To easily clean the upper surface (reticle placing surface) of a reticle holder. <P>SOLUTION: Illumination light IL is guided to upper surfaces (reticle placing surfaces) of reticle holders 34A, 34B by gratings 53A, 53B provided on a cleaning reticle RC and reflection surfaces 54A, 54B, and the upper surfaces are optically cleaned. In this way, only by irradiating the cleaning reticle RC with the illumination light IL for exposure, substances such as foreign matters or contamination substances adhering on the upper surfaces of the reticle holders can be decomposed and eliminated. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008166613(A) 申请公布日期 2008.07.17
申请号 JP20060356568 申请日期 2006.12.28
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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