发明名称 |
Method of manufacturing magneto-resistive device and apparatus for manufacturing the same |
摘要 |
<p>A method of manufacturing a magneto-resistive device on a substrate, the device having a high MR ratio even with a low RA, and an apparatus for manufacturing the same are provided. The magneto-resistive device having an MgO (magnesium oxide) layer provided between a ferromagnetic layer and a second ferromagnetic layer is manufactured by forming a film of the MgO layer in a film forming chamber (21) with the substrate (12) being at a floating potential.</p> |
申请公布号 |
EP2037512(A1) |
申请公布日期 |
2009.03.18 |
申请号 |
EP20080168830 |
申请日期 |
2007.02.26 |
申请人 |
CANON ANELVA CORPORATION |
发明人 |
NAGAMINE, YOSHINORI;TSUNEKAWA, KOJI;DJAYAPRAWIRA, DAVID DJULIANTO;MAEHARA, HIROKI |
分类号 |
H01L43/12;C23C14/08;C23C14/34;H01J37/34 |
主分类号 |
H01L43/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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