发明名称 Wiring board
摘要 The wiring board of the present invention includes at least one insulating layer and at least one conductor layer being alternately laminated, a semiconductor element connection pad formed on an upper surface of the insulating layer at an uppermost layer of the insulating layers, a cap connection pattern arranged so as to surround a region where the semiconductor element connection pad is formed, and at least one strip-shaped pattern extending from the semiconductor element connection pad to a region outside an end portion on the region side of the cap connection pattern. The cap connection pattern is formed by a plurality of island-shaped patterns spaced apart from one another, and the strip-shaped pattern is formed between the adjacent island-shaped patterns on the upper surface of the insulating layer at the uppermost layer.
申请公布号 US9412688(B2) 申请公布日期 2016.08.09
申请号 US201514806803 申请日期 2015.07.23
申请人 KYOCERA CORPORATION 发明人 Ito Takayuki
分类号 H01L23/48;H01L23/498;H05K1/11;H01L23/04;H01L23/10 主分类号 H01L23/48
代理机构 Volpe and Koenig, P.C. 代理人 Volpe and Koenig, P.C.
主权项 1. A wiring board comprising: at least one insulating layer and at least one conductor layer being alternately laminated; a semiconductor element connection pad including the conductor layer, formed on an upper surface of the insulating layer at an uppermost layer of the insulating layers; a cap connection pattern including the conductor layer, electrically connected to a metal cap with a solder, arranged so as to surround a region, in a plan view, where the semiconductor element connection pad is formed; and at least one strip-shaped pattern including the conductor layer, extending from the semiconductor element connection pad to a region outside an end portion on the region side of the cap connection pattern, wherein the cap connection pattern is formed by a plurality of island-shaped patterns spaced apart from one another, and wherein the strip-shaped pattern is formed between the adjacent island-shaped patterns on the upper surface of the insulating layer at the uppermost layer.
地址 Kyoto-Shi, Kyoto JP