| 发明名称 |
SULFATE-FREE FORMULATIONS FOR SKIN CLEANSING |
| 摘要 |
The present disclosure provides a cleansing composition that includes from about 20% to about 40% by weight of a primary anionic surfactant; from about 10% to about 30% by weight of an amphoacetate; from about 10% to about 30% by weight of a sultaine; and from about 0.5% to about 2% by weight of a fatty acid, wherein the amounts are based upon the total weight of the composition and the composition is free of anionic alkyl sulfates and alkyl ether sulfates. |
| 申请公布号 |
US2016296446(A1) |
申请公布日期 |
2016.10.13 |
| 申请号 |
US201615097450 |
申请日期 |
2016.04.13 |
| 申请人 |
RHODIA OPERATIONS |
发明人 |
TANAVADE Juie;PATEL Rajesh;GRIFFIN James |
| 分类号 |
A61K8/49;A61K8/46;A61Q19/00;A61Q19/10;A61K8/81;A61K8/42;A61K8/36 |
主分类号 |
A61K8/49 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A liquid cleansing composition comprising:
a. from about 20% to about 40% by weight of a primary anionic surfactant; b. from about 10% to about 30% by weight of an amphoacetate; c. from about 10% to about 30% by weight of a sultaine; and d. from about 0.5% to about 2% by weight of a fatty acid,wherein the amounts are based upon the total weight of the composition and the composition is free of anionic alkyl sulfates and alkyl ether sulfates. |
| 地址 |
Paris FR |
