| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern structure in which a swelling of an end of a pattern film is suppressed.SOLUTION: A pattern structure 100 comprises a base material 10, and a pattern film 14 formed on a surface 10S of the base material 10 by rupturing the film formed by an atomic layer deposition method. The pattern film 14 comprises an end part 14A including a rapture surface 14R connected to the surface 10S of the base material 10 and an upper surface 14S connected to the rapture surface 14R and extending along the surface 10S of the base material 10.SELECTED DRAWING: Figure 2 |
