PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING THIN FILM PATTERN USING THE SAME, PROTECTIVE FILM FOR ELECTRONIC DEVICE, TRANSISTOR, COLOR FILTER, ORGANIC EL DEVICE, GATE INSULATING FILM AND THIN FILM TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition in which the crosslinking efficiency of a condensate of an alkoxysilane can be enhanced without heat treatment at such a very high temperature as ≥500°C, and with which a thin film pattern excellent in electrical insulation can be obtained, and also to provide a method for producing a thin film pattern using the same.

SOLUTION: The photosensitive resin composition comprises the condensate of the alkoxysilane, a first photoacid or base generator which is activated by irradiation with light having a wavelength A to generate an acid or base, and a second photoacid or base generator which is activated by irradiation with light having a wavelength B different from the wavelength A to generate an acid or base. The method for producing a thin film pattern using the same is also provided.

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