| 摘要 |
PURPOSE: To ensure more satisfactory high sensitivity and high resolution by using a specified sensitizer in a three-component, chemical amplification type resist consisting of an alkali-soluble resin, an acid-decomposable dissolution inhibiting compd. and an optical acid generating agent. CONSTITUTION: An alkali-soluble resin (A), a 1,2-naphthoquinonediazido-5(and/ or-4)-sulfonic ester compd. (B), a low molecular compd. (C) having at least one acid-decomposable group and a mol. wt. of <=3,000, an optical acid generating agent (D) and a sensitizer (E) having absorption at the wavelength of light for exposure and having an alkali-soluble group are incorporated and the amt. of the component B is regulated to 0-95wt.%. Since the sensitizer is used, high resolution and high sensitivity can be ensured without producing scum. When the acid-decomposable dissolution inhibiting compd. and the naphthoquinonediazido type dissolution inhibiting compd. are used in combination as dissolution inhibiting compds., much superior resolution and, sensitivity can be ensured. |
