| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a quartz glass ingot of ultra low contamination and defect levels for use in semiconductor processing applications. <P>SOLUTION: In a method to form the quartz glass ingot of ultra low contamination and defect levels by firing a high-purity quartz form as the feedstock, the quartz glass ingot is free-formed on a platen rotating concentrically with the feedstock quartz article. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
