| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate exposure method capable of reducing an exposure time for a substrate. <P>SOLUTION: The method comprises: first, placing a substrate to be exposed on a stage; dividing the substrate into a plurality of exposure regions; disposing a mask on one of first regions of the exposure regions adjacent to one side of the substrate; disposing an exposure device above the mask corresponding to one side of the substrate; subjecting the first region of the substrate to scan exposure in a second direction opposite to a first direction while moving the mask and the stage in the first direction perpendicular to one side of the substrate; and subjecting a second region of the substrate adjacent to the first region of the substrate in the second direction to perform scan exposure in the second direction while moving the mask in the second direction and moving the stage in the first direction. <P>COPYRIGHT: (C)2008,JPO&INPIT |
