| 摘要 |
<P>PROBLEM TO BE SOLVED: To minimize the effect of different transmission losses between P polarization and S polarization, in an optical system of a scatterometer. <P>SOLUTION: An inspection system constituted to measure the characteristic of a substrate W is provided. The inspection system comprises an radiation projector 2 constituted to project the radiation onto the substrate W, a detector 18 constituted to detect the radiation reflected from the substrate W and the radiation reflected from a reference mirror 14, and a data processing unit constituted to normalize the detected radiation beam by considering the transmission losses received by the P polarization and S polarization defined by a polarizer 17. <P>COPYRIGHT: (C)2008,JPO&INPIT |
