发明名称 METHOD OF FORMING GRAFT PATTERN, GRAFT PATTERN MATERIAL OBTAINED THEREBY, AND LITHOGRAPHIC PROCESS USING THE SAME
摘要 <p>A graft polymer is formed in patterned fashion in an exposure region by bringing a polymer compound having an oil repellent/water repellent functional group and a polymerizable unsaturated double bond into contact with a base material capable of generating radicals upon exposure to light and thereafter carrying out exposure to light. In that instance, "regions capable of generating radicals upon exposure to light" providing base points of graft polymerization may be formed over the entire surface of the base material, followed by patterned exposure, or "regions capable of generating radicals upon exposure to light" may be formed in patterned fashion over the entire surface of the base material. When use is made of a polymer compound soluble or swellable in water or an alkali water, in the purification step, any unreacted polymer compound can be removed by means of water, an alkali water or a water containing a small amount of organic solvent. Thus, excellence in environmental compatibility is ensured.</p>
申请公布号 KR20080003389(A) 申请公布日期 2008.01.07
申请号 KR20077025299 申请日期 2007.10.31
申请人 FUJI FILM CORPORATION 发明人 KAWAMURA KOICHI;WAKATA YUICHI
分类号 G03F7/004;B82B3/00;C08F299/00;G03F7/26 主分类号 G03F7/004
代理机构 代理人
主权项
地址