发明名称 SYSTEM AND METHOD FOR CONTROLLING CRYSTAL INGOT GROWTH APPARATUS
摘要 An embodiment relates to a control system for a single crystal ingot growth apparatus, which is capable of minimizing a difference between a target pulling speed and an actual pulling speed in a process of growing a single crystal ingot. The control system for a single crystal ingot growth apparatus comprises: an ingot length setting unit which sets a length of a single crystal ingot; a target value setting unit which sets a target diameter, a target pulling speed, and a target temperature based on the length of the single crystal ingot; a pulling speed control unit which generates a calibration pulling speed by comparing the target diameter with an actual diameter of the single crystal ingot being grown in the single crystal ingot growth apparatus, and controls a pulling speed of the single crystal ingot growth apparatus based on the calibration pulling speed; a pulling speed calibration unit which calibrates an average pulling speed, which generates an average of actual pulling speeds for each unit time for a predetermined period before and after a reference time during a process of growing the single crystal ingot, to the target pulling speed; a compensation signal generation unit which generates a compensation signal by comparing the average pulling speed with the target pulling speed; and a temperature control unit which generates a compensation temperature by comparing the compensation signal with the target temperature and an actual temperature, and controls a temperature of the single crystal ingot growth apparatus based on the compensation temperature.
申请公布号 KR20160089629(A) 申请公布日期 2016.07.28
申请号 KR20150009048 申请日期 2015.01.20
申请人 LG SILTRON INCORPORATED 发明人 AN, YUN HA;NA, GWANG HA;KIM, YUN GOO
分类号 C30B15/20;C30B29/06 主分类号 C30B15/20
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