| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method which adequately dries a surface of a substrate while inhibiting or preventing collapse of a pattern, and to provide a substrate processing device.SOLUTION: A substrate processing method includes: a step (a step S1) where a substrate with a fine pattern formed on a surface is carried into a chamber; a rinse step (a step 4) where a chemical solution adhering to the surface of the substrate is rinsed away with a rinse liquid; and a dry step (a step 6) where superheated steam is supplied to an upper surface of the substrate to dry the surface of the substrate after the rinse step.SELECTED DRAWING: Figure 5 |
