发明名称 |
Organic light emitting diode display device and method of fabricating the same |
摘要 |
In an organic light emitting diode (OLED) display device and a method for fabricating the same, OLED pixels are patterned through a photolithography process, so a large area patterning can be performed and a fine pitch can be obtained, and an organic compound layer can be protected by forming a buffer layer of a metal oxide on an upper portion of the organic compound layer or patterning the organic compound layer by using a cathode as a mask, improving device efficiency. In addition, among red, green, and blue pixels, two pixels are patterned through a lift-off process and the other remaining one is deposited to be formed without patterning, the process can be simplified and efficiency can be increased. |
申请公布号 |
US9425438(B2) |
申请公布日期 |
2016.08.23 |
申请号 |
US201514644901 |
申请日期 |
2015.03.11 |
申请人 |
LG Display Co., Ltd. |
发明人 |
Kim Young-Mi;Yoon Jong-Geun;Heo Joon-Young;Park Han-Sun;Do Eui-Doo;Lee Yeon-Kyeong;Kim Dae-Hyun;Shim Jong-Sik |
分类号 |
H01L51/50;H01L51/56;H01L51/00;H01L51/52;H01L27/32 |
主分类号 |
H01L51/50 |
代理机构 |
Morgan, Lewis & Bockius LLP |
代理人 |
Morgan, Lewis & Bockius LLP |
主权项 |
1. A method for fabricating an organic light emitting diode (OLED) display device, the method comprising:
forming a plurality of first electrodes on a substrate; forming a first hole injection layer, a first hole transport layer, a first light emitting layer, a first electron transport layer, and a first buffer layer in a laminated manner on the substrate through a first photo process including a first etching process; forming a second hole injection layer, a second hole transport layer, a second light emitting layer, a second electron transport layer, and a second buffer layer in a laminated manner on the substrate through a second photo process including a second etching process; forming a third hole injection layer, a third hole transport layer, a third light emitting layer, a third electron transport layer, and a third buffer layer in a laminated manner on the substrate through a third photo process including a third etching process; and forming a plurality of second electrodes respectively on the first, second, and third buffer layers, wherein the first, second, and third buffer layers are made of a metal oxide. |
地址 |
Seoul KR |