发明名称 |
LAMINATE, KIT FOR MANUFACTURING ORGANIC SEMICONDUCTOR, AND
RESIST COMPOSITION FOR MANUFACTURING ORGANIC SEMICONDUCTOR |
摘要 |
Provided are a laminate which is capable of forming an excellent organic semiconductor pattern, a kit for manufacturing an organic semiconductor, which is used to manufacture such a laminate, and a resist composition for manufacturing an organic semiconductor, which is used for the kit for manufacturing an organic semiconductor.;The laminate includes an organic semiconductor film, a protective film on the organic semiconductor film, and a resist film on the protective film, in which the resist film is formed of a photosensitive resin composition that contains a photoacid generator (A) which generates an organic acid of which a pKa of the generated acid is −1 or less and a resin (B) which reacts with an acid generated by the photoacid generator so that the rate of dissolution in a developer containing an organic solvent is decreased. |
申请公布号 |
US2016240816(A1) |
申请公布日期 |
2016.08.18 |
申请号 |
US201615139989 |
申请日期 |
2016.04.27 |
申请人 |
FUJIFILM Corporation |
发明人 |
MIZUTANI Kazuyoshi;IWAI Yu;KOYAMA Ichiro;KAMOCHI Yoshitaka |
分类号 |
H01L51/52;G03F7/11;G03F7/004;G03F7/039;H01L51/42;B32B27/08 |
主分类号 |
H01L51/52 |
代理机构 |
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代理人 |
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主权项 |
1. A laminate comprising:
an organic semiconductor film; a protective film on the organic semiconductor film; and a resist film on the protective film, wherein the resist film is formed of a photosensitive resin composition that contains a photoacid generator (A) which generates an organic acid of which a pKa of the generated acid is −1 or less and a resin (B) which reacts with an acid generated by the photoacid generator so that the rate of dissolution in a developer containing an organic solvent is decreased. |
地址 |
Tokyo JP |