| 摘要 |
Provided are a pattern formation method for producing a laminate having excellent adhesion among layers of resist film, affording a high-definition pattern, and having high gas-barrier properties and solvent resistance; and an electronic device manufactured using the same. The pattern formation method includes (1) a step for using a composition to form a film on a support, (2) an exposure step for irradiating a prescribed section of the film with an active energy beam, and changing the developability of the prescribed section; and (3) a developing step for developing the film to obtain a pattern. A plurality of compositions that differ in solubility to the developing solution are used as the composition, and the resulting pattern has a multilayer structure. |
