| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fluorine-containing photosensitive composition which is a photosensitive liquid-repellent finishing agent capable of being patterned by photolithography, satisfies both of liquid repellency and photosensitivity, and has all of adhesion to a substrate, hardness of a liquid-repellent coating film and environmental adaptation. <P>SOLUTION: The fluorine-containing photosensitive composition includes a fluorine compound (A), at least one metal compound (B) selected from the group consisting of a hydrolyzable metal alkoxide, a hydrolyzed compound thereof and a condensate thereof, a solvent (C) and a photoacid generator (D) as essential components. <P>COPYRIGHT: (C)2008,JPO&INPIT |
