PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE THEREOF, CURED PRODUCT THEREOF AND PATTERN FORMING METHOD USING COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a pattern having high resolution and a high aspect ratio is formed and which has high sensitivity.

SOLUTION: The photosensitive resin composition contains: a photo-cationic polymerization initiator (A) which is sulfonium tris(pentafluoroethyl)trifluorophosphate; and a bisphenol fluorene epoxy resin (B) represented by formula (1), wherein R represents an alkylene group and n is an average and represents a positive real number of 0-30.

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