| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE AND CURED MATERIAL OF THE COMPOSITION, AND PATTERN FORMING METHOD USING THE COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-sensitive photosensitive resin composition, with which a pattern of high-resolution and high aspect ratio can be formed. <P>SOLUTION: The photosensitive resin composition contains a polyfunctional epoxy resin (A) in a specified structure; and a cationic photopolymerization initiator (B) that is sulfonium-tris(pentafluoroethyl) trifluorophosphate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2008020839(A) |
申请公布日期 |
2008.01.31 |
| 申请号 |
JP20060194591 |
申请日期 |
2006.07.14 |
| 申请人 |
NIPPON KAYAKU CO LTD;MICROCHEM CORP |
发明人 |
ONO YOSHIYUKI;SAKAI AKIRA |
| 分类号 |
G03F7/038;C08G59/68;G03F7/004;H05K3/28 |
主分类号 |
G03F7/038 |
| 代理机构 |
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