发明名称 TOUCH PANEL STRUCTURE AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY APPARATUS AND METHOD FOR MANUFACTURING THE SAME
摘要 A contact hole that penetrates a protective insulating film, an interlayer insulating film, and a transparent cap film and has a surface of a low-reflection film uncovered as a bottom surface is formed in a lead-out wiring region. A lower-layer terminal portion is formed by the low-reflection film and a low-resistance conductive film below the bottom surface of the contact hole. A contact hole that penetrates the protective insulating film and a transparent cap film and has a surface of a low-reflection film uncovered as a bottom surface is formed in the lead-out wiring region. An upper-layer terminal portion is formed by the low-reflection film and a low-resistance conductive film below the bottom surface of the contact hole.
申请公布号 US2016162080(A1) 申请公布日期 2016.06.09
申请号 US201514926753 申请日期 2015.10.29
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 HAYASHI Masami;AOKI Masaru
分类号 G06F3/045;G02F1/1335;G02F1/1333;G06F3/041;G09G3/36 主分类号 G06F3/045
代理机构 代理人
主权项 1. A touch panel structure, comprising: a substrate having one main surface and the other main surface; a touch sensor layer that is located on the one main surface of said substrate and includes a display region and a lead-out wiring region including an external terminal portion for external connection; and a color filter layer located on the other main surface of said substrate such that said color filter layer overlaps said display region of said touch sensor layer in plan view, wherein said touch sensor layer includes: laminated wiring formed by a conductive film, a low-reflection film, and a transparent film laminated in the stated order;an insulating film formed to cover said laminated wiring; andan opening that is selectively formed in said lead-out wiring region, penetrates said insulating film and said transparent film, and has a surface of said low-reflection film uncovered as a bottom surface, and said external terminal portion is formed by said low-reflection film and said conductive film below the bottom surface of said opening.
地址 Tokyo JP