发明名称 THIN FILM DEPOSITION COMPOSITION CONTAINING GERMANIUM DERIVATIVE, THE GERMANIUM-CONTAINING THIN FILM PREPARED BY USING THE SAME AND THE METHOD OF PRODUCING A GERMANIUM-CONTAINING THIN FILM USING THE SAME
摘要 The present invention relates to a composition including a germanium derivative which can be used as a precursor for the formation of various germanium-containing thin films, a germanium-containing thin film manufactured by using the same, and a method for manufacturing a germanium-containing thin film using the same.
申请公布号 KR20160086162(A) 申请公布日期 2016.07.19
申请号 KR20150003551 申请日期 2015.01.09
申请人 DNF CO., LTD. 发明人 KIM, MYONG WOON;LEE, SANG ICK;SHIN, HYUNG SOO;JANG, HONG SEOK;LEE, KANG YONG;KIM, MIN SUNG;SEOK, JANG HYEON;JEON, SANG YONG;KIM, DO YEON
分类号 H01L21/02 主分类号 H01L21/02
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