发明名称 Overlay box structure for measuring process induced line shortening effect
摘要 The present invention enables the user to measure process line shortening (PLS) on an overlay tool. In an example embodiment ( 900 ), to obtain the PLS, the user applies a method to determine the misalignment (MA) of a composite image on a substrate ( 940 a), from the composite image the user may determine the total line ( 940 b) shortening (TLS) and the equipment line ( 940 c) shortening (ELS). The process line shortening (PLS) is determined ( 940 d) as a function of TLS and ELS.
申请公布号 US7332255(B2) 申请公布日期 2008.02.19
申请号 US20040841147 申请日期 2004.05.07
申请人 NXP B.V. 发明人 YAMAGUCHI YUJI;LEROUX PIERRE
分类号 G03F9/00;G01B9/00;G01B11/00;G03C5/00;G03F7/20;G06K9/00;H01L23/544 主分类号 G03F9/00
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