| 摘要 |
PROBLEM TO BE SOLVED: To ensure adhesion between a mask and an exposure target over a large area.SOLUTION: A mask for near-field exposure described in an embodiment comprises a silicon substrate and a near-field light generating part formed on the silicon substrate, which is a layer or a laminate film of layers containing at least one element selected from the group consisting of Au, Al, Ag Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd and C. |
