PHOTORESIST TOPCOAT COMPOSITION AND METHOD OF PROCESSING PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a topcoat composition exhibiting an improved receding contact angle, which responds to a higher scanning speed on an exposure tool in immersion lithography.SOLUTION: A photoresist topcoat composition is provided, which comprises a first polymer including each repeating unit of specific formulae (I) and (II), a second polymer including each repeating unit of specific formulae (III) and (IV), and a solvent.SELECTED DRAWING: None