Integrated circuit having strained fins on bulk substrate

摘要

A method includes forming a set of fins composed of a first semiconductor material. The method further heats the set of fins to condense the fins and cause growth of a layer of oxide on vertical sidewalls thereof, masking a first sub-set of the fins, forming a plurality of voids in the oxide by removing a second sub-set of fins, where each void has a three-dimensional shape and dimensions that correspond to a three dimensional shape and dimensions of a corresponding removed fin from the second sub-set, and epitaxially growing in the voids a third sub-set of fins. The third sub-set of fins is composed of a second semiconductor material that differs from the first semiconductor material. Each fin of the third subset has a three dimensional shape and dimensions of a corresponding removed fin from the second sub-set. At least one structure formed by the method is also disclosed.

主权项

1. A structure, comprising:
a strain relaxed buffer disposed on a surface of a substrate; a set of fins disposed on a surface of the strain relaxed buffer, the set of fins comprised of a first subset of fins comprised of s-Si1-xGex and a second subset of fins comprised of s-Si, where the strain relaxed buffer is comprised of Si1-xGex, where x has a non-zero value=n, where the first subset of fins are comprised of Si1-xGex where x in the first subset of fins has a value=m, where m>n; and a layer disposed in a top surface portion of the strain relaxed buffer of Si1-xGex, the layer being disposed at least between individual fins of the set of fins, where x in the layer has the value=m.