SILICON-BASED COMPONENT WITH AT LEAST ONE CHAMFER AND ITS FABRICATION METHOD

摘要

The invention relates to a silicon-based component with at least one chamfer formed from a method combining at least one oblique side wall etching step with a “Bosch” etching of vertical side walls, thereby enabling aesthetic improvement and improvement in the mechanical strength of components formed by micromachining a silicon-based wafer.

主权项

1. A method for fabricating a micromechanical component made of a silicon-based material comprising the following steps:
a) taking a silicon-based substrate; b) forming a mask pierced with holes on a horizontal portion of the substrate; c) etching, in an etching chamber, predetermined oblique walls, in part of the thickness of the substrate, from holes in the mask, in order to form upper chamfered surfaces of the micromechanical component; d) etching, in the etching chamber, substantially vertical walls, in at least part of the thickness of the substrate, from the bottom of the etch made in step c), in order to form peripheral walls of the micromechanical component beneath the upper chamfered surfaces; e) releasing the micromechanical component from the substrate and the mask.