摘要 |
<p>PROBLEM TO BE SOLVED: To provide an X-ray mask structure body having a replaceable thin film in which dust does not stick on a mask pattern surface facing an object to be transferred, and breakdown of a membrane due to contact of a mask and a wafer can be prevented. SOLUTION: In an X-ray mask structure body constituted of an X-ray absorber 1, a retaining membrane 2 for retaining the absorber 1, and a holding frame 3 for holding the retaining membrane, a thin film 7 is formed on the side facing an object to be transferred, keeping an interval from the X-ray absorber. On the surface of the thin film, a measuring mark 10 for detecting the interval between the thin film and the object to be transferred or the displacement of the thin film is formed.</p> |