发明名称 X-RAY MASK STRUCTURE BODY, X-RAY ALIGNER USING THE X-RAY MASK STRUCTURE BODY, AND SEMICONDUCTOR DEVICE FORMED BY USING THE X-RAY MASK STRUCTURE BODY
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray mask structure body having a replaceable thin film in which dust does not stick on a mask pattern surface facing an object to be transferred, and breakdown of a membrane due to contact of a mask and a wafer can be prevented. SOLUTION: In an X-ray mask structure body constituted of an X-ray absorber 1, a retaining membrane 2 for retaining the absorber 1, and a holding frame 3 for holding the retaining membrane, a thin film 7 is formed on the side facing an object to be transferred, keeping an interval from the X-ray absorber. On the surface of the thin film, a measuring mark 10 for detecting the interval between the thin film and the object to be transferred or the displacement of the thin film is formed.</p>
申请公布号 JPH10144594(A) 申请公布日期 1998.05.29
申请号 JP19960302876 申请日期 1996.11.14
申请人 CANON INC 发明人 MIYAJI GOJI;CHIBA KEIKO;CHITOKU KOICHI;OSAWA MASARU
分类号 G03F1/22;G03F1/44;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/22
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