发明名称 Photosensitive composition
摘要 <p>Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysioxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an aromatic or alicyclic diamine with a 4,4' -(hexafluoroisopropylidene)diphthalic acid dianhydride, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.</p>
申请公布号 EP0957126(A1) 申请公布日期 1999.11.17
申请号 EP19990106183 申请日期 1999.04.09
申请人 NIPPON MEKTRON, LIMITED 发明人 CHIANG, LIN-CHIU;LIN, JENQ-TAIN;SENSUI, NOBUYUKI
分类号 C08G73/10;G03F7/038;G03F7/075;(IPC1-7):C08G73/10 主分类号 C08G73/10
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