发明名称 Method for fabricating semicondutor memory device
摘要 A semiconductor memory device is provided which prevents a lifting phenomenon by improving an adhesive strength between an upper electrode and an interlayer insulating layer. The semiconductor memory device includes a capacitor formed on a semiconductor substrate, wherein the capacitor includes a lower electrode, a dielectric layer and an upper electrode; an adhesion layer formed on the upper electrode; an interlayer insulating layer covering the capacitor, wherein a portion of the interlayer insulating layer is in contact with the adhesion layer; and a contact hole, formed within the interlayer insulating layer, whose bottom exposes the upper electrode and whose sidewalls expose the interlayer insulating layer and the adhesion layer.
申请公布号 US2002000594(A1) 申请公布日期 2002.01.03
申请号 US20010892537 申请日期 2001.06.28
申请人 CHOI EUN-SEOK;YEOM SEUNG-JIN 发明人 CHOI EUN-SEOK;YEOM SEUNG-JIN
分类号 H01L27/105;H01L21/02;(IPC1-7):H01L29/94 主分类号 H01L27/105
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