发明名称 FLASH MEMORY HAVING LOCAL SONOS STRUCTURE USING NOTCHED GATE AND MANUFACTURING METHOD THEREOF
摘要 A notched gate SONOS transistor includes: a substrate having source/drain regions; a gate insulator layer on the substrate between the source/drain regions; a notched gate structure, on the gate insulator layer, having at least one notch; and at least one ONO wedge structure in the at least one notch, respectively, of the gate structure.
申请公布号 US2004183106(A1) 申请公布日期 2004.09.23
申请号 US20030388427 申请日期 2003.03.17
申请人 KIM SANG SU;LEE NAE-IN;BAE GEUM-JONG;KIM KI CHUL;RHEE HWA SUNG 发明人 KIM SANG SU;LEE NAE-IN;BAE GEUM-JONG;KIM KI CHUL;RHEE HWA SUNG
分类号 H01L21/8247;H01L21/28;H01L21/336;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L27/148 主分类号 H01L21/8247
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