发明名称 DEVICE, SYSTEM, AND METHOD FOR SUBSTRATE TREATMENT
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment device, a substrate treatment system, and a substrate treatment method that can make a liquid membrane formed on the substrate surface in a short period of time freeze, and moreover, without making the substrate surface contaminated. SOLUTION: The liquid membrane is formed on the substrate surface Wf by supplying DIW (deionized water) onto the substrate surface Wf, while holding a substrate W with a spin chuck 2 in a substantially horizontal posture. Subsequently, the substrate W is rotated, while supplying a liquid refrigerant onto the substrate rear-face Wb. As a result of this, it is possible to uniformly spread the liquid refrigerant on the whole rear face of the substrate W by a centrifugal force acting on the liquid refrigerant, in contact with the substrate W. As a result, the substrate W is cooled directly by the liquid refrigerant in contact with the rear face Wb so as to freeze the liquid membrane in a relatively short period of time. Since it is possible to prevent the liquid membrane formed on the substrate surface Wf from coming into contact with the liquid refrigerant, the liquid membrane can be frozen, without making the substrate surface Wf contaminated. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008028008(A) 申请公布日期 2008.02.07
申请号 JP20060196584 申请日期 2006.07.19
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 FUJIWARA NAOZUMI;MIYA KATSUHIKO;MATSUBARA HIDEAKI
分类号 H01L21/304;B08B3/02;B08B3/10;B08B7/00;G02F1/1333 主分类号 H01L21/304
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