| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a project exposure device capable of controlling a variation range in the transmission factor distribution of an illumination unevenness compensation filter that compensates illumination unevenness. <P>SOLUTION: The project exposure device 10 has an exposure optical system that projects a projected pattern formed on a photomask 14 on a substrate 32 on exposure stage 31 with exposure light. In addition, an exposure optical system in the individual project exposure device 10 is provided with a plurality of the illumination unevenness compensation filters 40 having a transmission factor distribution opposite to a proper illumination distribution. A plurality of the illumination unevenness compensation filters 40 are disposed so as to allow transmission factor distributions to be deviated from each other. <P>COPYRIGHT: (C)2008,JPO&INPIT |
