| 摘要 |
A dry etching apparatus is provided to withdraw an object between the outside of a process chamber and a stage inside the process chamber by using a handler and a lift member. A dry etching apparatus includes a process chamber(10), a stage(20), a first electrode, a second electrode, a handler(50) and a lift member(60). The handler injects or withdraws an object(70) through an input hole of the process chamber. The lift member raises or lowers the object from the handler. The handler has a ring unit and a support unit. The ring unit is formed to correspond to a contour of the object. The support unit is protruded to the center part in the ring unit and supports the object.
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