| 发明名称 | Methods of inhibiting the growth of onychomycosis and urushiol-induced allergic contact dermatitis | ||
| 摘要 | A method for treating onychomycosis and skin conditions such as urushiol-induced allergic contact dermatitis comprises coating the affected nail or skin with a solution comprising an at least a primary diamine with modified diphenylmethane diisocyanates and a carrier solvent/reactant. | ||
| 申请公布号 | US9402860(B2) | 申请公布日期 | 2016.08.02 |
| 申请号 | US200812103353 | 申请日期 | 2008.04.15 |
| 申请人 | Chesson Laboratory Associates, Inc. | 发明人 | Kovacs Stephen G.;Chesson Jerry |
| 分类号 | A61K31/785;A61K9/00;A61K9/70;B27K3/15;B27K3/22;B27K3/26;B27K3/28 | 主分类号 | A61K31/785 |
| 代理机构 | Myers Bigel & Sibley, P.A. | 代理人 | Myers Bigel & Sibley, P.A. |
| 主权项 | 1. A method of treating onychomycosis and/or urashiol-induced contact dermatitis comprising topically applying a composition comprising (i) a primary diamine comprising a polyether segment; (ii) a secondary aromatic diamine; (iii) a polyisocyanate; and (iv) optionally, a polyol, and/or a reaction product thereof. | ||
| 地址 | Durham NC US | ||